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논문

논문 기본정보

Si3N4/SnZnO/AZO/Ag/Ti/ITO 다층 박막의 적층 횟수에 따른 광학적 특성

논문 개요
기관명 NDSL
저널명 전기전자재료학회논문지 = Journal of the Korean institute of electronic material engineers
ISSN 1226-7945,
ISBN

논문 개요

논문저자 및 소속기관 정보
저자(한글) 이상윤,장건익
저자(영문)
소속기관
소속기관(영문)
출판인
간행물 번호
빌행연도 2015-01-01
초록 In this study, $Si_3N_4$ /SnZnO/AZO/Ag/Ti/ITO multi-layer film were prepared on glass substrate by DC/RF magnetron sputtering method. To prevent interfacial reaction between Ag and ITO layer, Ti buffer layer was inserted. Optical properties and sheet resistance were studied depending on laminating times of each multi-layered film especially in visible ray. The simulation program, EMP (essential macleod program), was adopted and compared with experimental data to expect the experimental result. It was found out that the transmittance of the first stacked $Si_3N_4$ /SnZnO/AZO/Ag/Ti/ITO multi-layer film was more than 90%. However, with increasing stacking times, the optical properties of $Si_3N_4$ /SnZnO/AZO/Ag/Ti/ITO multi-layer film get worse. Consequently, Ti layer is good for oxidation barrier, but too many uses of this layer may have an adverse effect to optical properties of TCO film.
원문URL http://click.ndsl.kr/servlet/OpenAPIDetailView?keyValue=03553784&target=NART&cn=JAKO201503460492107
첨부파일

추가정보

추가정보
과학기술표준분류
ICT 기술분류
DDC 분류
주제어 (키워드) Transparent conductive oxide Magnetron sputtering Multi-layer Transmittance